Hamao Noboru | Opto-electronics Research Laboratories Nec Corporation

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著作論文

Chlorine-Based Smooth Reactive Ion Beam Etching of Indium-Containing III-V Compound Semiconductor
Smooth and Vertical InP Reactive Ion Beam Etching with Cl_2 ECR Plasma
Very Low Threshold AlGaAs/GaAs Quantum Well Lasers Fabricated by Self-Aligned Impurity Induced Disordering
Switching Experiments with a Mach-Zehnder-type All-Optical Device Based on the Band-Filling Nonlinearity in a GaAs Waveguide and Reduction in Its Relaxation Time
High Speed Response in Optoelectronic Gated Thyristor

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