Tsuya Hideki | Fundamental Research Laboratories Nec Corporation
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概要
関連著者
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Tsuya Hideki
Fundamental Research Laboratories Nec Corporation
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Tsuya Hideki
Fundamental Research Laboratories
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ENDO Nobuhiro
Microelectronics Research Laboratories, Nippon Electric Co., Ltd.
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KANAMORI Masaru
Fundamental Research Laboratories, Nippon Electric Co., Ltd.
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Endo Nobuhiro
Microelectronics Research Laboratories
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Kanamori Masaru
Fundamental Research Laboratories Nec Corporation
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Tsuya Hideki
Fundamental Research Laboratories Nippon Electric Co. Ltd.
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Tsuya Hideki
Fundamental Research Laboratory Nippon Electric Co. Ltd.
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Tatsumi Toru
Fundamental Research Laboratories Nec Corporation
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Kurogi Yukinori
Microelectronics Research Laboratories Nippon Electric Co. Ltd.
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Kurogi Yukinori
Microelectronics Research Laboratories Nec Corporation
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Aizaki Naoaki
Fundamental Research Laboratories Nec Corporation
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TANNO Kohetsu
Fundamental Research Laboratories
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KITAJIMA Hiroshi
Fundamental Research Laboratories
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KONDO Yojiro
Fundamental Research Laboratories, Nippon Electric Co., Ltd.
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ISHITANI Akihiko
Fundamental Research Laboratories, NEC Corporation
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Kitajima H
Forestry And Forest Products Research Institute
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Endo Nobuhiro
Microelectronics Research Laboratories Nec Corporation
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Endo Nobuhiro
Microelectronics Research Laboratories Nippon Electric Co. Ltd.
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Tanno Kohetsu
Fundamental Research Laboratories:(present Address) 1st Lsi Division Nec Dorporation Ltd.
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Ishitani Akihiko
Fundamental Research Laboratories Nec Corporation
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Kondo Yojiro
Fundamental Research Laboratories Nippon Electric Co. Ltd.:(present Address) Resources And Environme
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TSUYA Hideki
Fundamental Research Laboratories, NEC Corporation
著作論文
- Selective Silicon Epitaxy Using Reduced Pressure Technique
- Superconducting Properties of Fe-Sn Superimposed Films
- Behaviours of Thermally Induced Microdefects in Heavily Doped Silicon Wafers
- Advanced Techniques to Decrease Defect Density in Molecular Beam Epitaxial Silicon Films
- Microdefects Formed in Carbon-Doped CZ Silicon Crystals by Oxygen Precipitation Heat Treatment
- Local Loading Effect in Selective Silicon Epitaxy