Ishigami Shun-ichiro | Central Research Institute Mitsubishi Materials Corporation

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概要

• 同名の論文著者
• Central Research Institute Mitsubishi Materials Corporationの論文著者

関連著者

• FURUYA Hisashi

  Central Research Inst. Mitsubishi Materials Corporation

• Ishigami Shun-ichiro

  Central Research Institute, Mitsubishi Materials Corporation

• 石神 俊一郎

  三菱マテリアル中央研究所

• Ishigami Shun-ichiro

  Central Research Institute Mitsubishi Materials Corporation

• Furuya H

  Department Of Electrical Engineering Osaka University

• SHINGYOUJI Takayuki

  Mitsubishi Materials Silicon Corporation

• SHINGYOUJI Takayuki

  Central Research Institute, Mitsubishi Materials Corporation

• Shingyouji T

  Mitsubishi Materials Corp. Saitama Jpn

• Shingyouji Takayuki

  Central Research Inst. Mitsubishi Materials Corporation

• Kawai Yoshinobu

  Welding Research Institute Osaka University

• Kawai Yoshinobu

  Interdiciplinary Gradate School Of Engineering Sciences Kyushu University

• Kawai Y

  Welding Research Institute Osaka University

• SHINYASHIKI Hiroshi

  Central Research Institute, Mitsubishi Materials Corporation

• 河合 良信

  Kyushu Univ. Fukuoka

• Shinyashiki Hiroshi

  Central Research Institute Mitsubishi Materials Corporation

• Kondoh H

  Ricoh Co. Ltd. Miyagi Jpn

• RYUTA Jiro

  Central Research Institute, Mitsubishi Materials Corporation

• Kondoh Hideyuki

  Central Research Institute, Mitsubishi Materials Corporation

• Kawai Yukio

  Mitsubishi Materials Silicon Corporation

• ISHII Satoru

  Central Research Institute, Mitsubishi Materials Corporation

• KAWAI Yukio

  Mitubishi Materials Silicon Corporation

• SAITOH Yuichi

  Mitubishi Materials Silicon Corporation

• KAWAI Yukio

  Central Research Institute, Mitsubishi Materials Corporation

• SHINCYOUJI Takayuki

  Central Research Institute, Mitsubishi Materials Corporation

• Ryuta Jiro

  Central Research Institute Mitsubishi Materials Corporation

• FURUYA Hisashi

  Central Research Institute, Mitsubishi Materials Corporation

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著作論文

• Effect of Native Oxide upon Formation of Amorphous SiO_x Layer at the Interface of Directly Bonded Silicon Wafers
• Effect of Interstitial Oxygen on Formation of Amorphous SiO_x Layer in Directly Bonded Czoehralski Silicon Wafers
• A Study of Defect Formation Mechamism at Edges of Local Oxidation of Silicon Structure
• Metal Impurity Trapping Effect by Stress at Edges of Local Oxidation of Silicon Structure
• Stress-Enhanced Diffusion of Boron at the Interface of a Directly Bonded Silicon Wafer

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