Imamura Yoshihiro | Atsugi Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation
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概要
- 同名の論文著者
- Atsugi Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporationの論文著者
関連著者
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Imamura Yoshihiro
NTT Atsugi Electrical Communication Laboratories
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Imamura Yoshihiro
Atsugi Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation
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Ito Tomonori
Ntt Atsugi Electrical Communication Laboratories
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Shinohara Masanori
NTT Atsugi Electrical Communication Laboratories
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Shinohara M
Shimadzu Corporation
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Imamura Y
Yamanashi Univ. Kofu Jpn
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Shinohara M
Surface Analysis And Semiconductor Equipment Department Shimadzu Corporation
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IMAMURA Yoshihiro
Atsugi Electrical Communication Laboratory, Nippon Telegraph and Telephone Public Corporation
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Imamura Yoshihiro
Atsugi Electrical Communication Laboratories Nippon Telegraph And Telephone Public Corp.
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Yamada Kazushi
Department Of Polymer Science And Engineering Kyoto Institute Of Technology
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Yamada Kohji
NTT Atsugi Electrical Communication Laboratories
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ITO Tomonori
Atsugi Electrical Communication Laboratory, Nippon Telegraph and Telephone Public Corporation
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SHINOHARA Masanori
Atsugi Electrical Communication Laboratory, Nippon Telegraph and Telephone Public Corporation
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Yamada Keiichi
Department Of Electrical Engineering Hiroshima University
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Oe Kunishige
Atsugi Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation
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WADA Kazumi
Atsugi Electrical Communication Laboratory, Nippon Telegraph and Telephone Public Corporation
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Wada Kazumi
Atsugi Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation
著作論文
- Dislocation Propagation into MBE Grown GaAs Layers under the Condition of Misfit Dislocation Generation
- Misfit Dislocation Generation for MBE Grown GaAs on In-Doped LEC-GaAs Substrates
- Origin of Surface Defects on Molecular Beam Epitaxially Grown GaAs
- Electrical Properties of Oval Defects in GaAs Grown by MBE
- Two-Dimensional Electron Gas at n-AlGaAs/GaAs Interface Grown by Molecular-Beam Epitaxy Using Direct-Radiation Substrate Heating