KIM Younsoo | Memory Research and Development Division, Hynix Semiconductor Inc.
スポンサーリンク
概要
関連著者
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Roh Jae-sung
Memory Research And Development Division Hynix Semiconductor Inc.
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SUN Ho-Jung
Memory Research and Development Division, Hynix Semiconductor Inc.
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KIM Younsoo
Memory Research and Development Division, Hynix Semiconductor Inc.
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Roh Jae-sung
Memory R&d Division Hynix Semiconductor Inc.
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Lee Jong-min
Memory Research And Development Division Hynix Semiconductor Inc.
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SOHN Hyun-Chul
Memory R&D Division, Hynix Semiconductor Inc.
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Kim Younsoo
Memory Research And Development Division Hynix Semiconductor Inc.
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Roh J
Memory Research And Development Division Hynix Semiconductor Inc.
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Hong Kwon
Memory Research And Development Division Hynix Semiconductor Inc.
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Cho Kwang-jun
Memory Research And Development Division Hynix Semiconductor Inc.
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Kim Kyong-min
Memory R & D Division Hyundai Electronics Industries Co. Ltd.
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Kim Kyong-min
Memory Research And Development Division Hynix Semiconductor Inc.
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Sohn H‐c
Hynix Semiconductor Inc. Kyoungki‐do Kor
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Sohn Hyun-chul
Memory R&d Division Hynix Semiconductor Inc.
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Sohn Hyun-chul
Memory Research And Development Division Hynix Semiconductor Inc.
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PARK Sung-Eon
Memory Research and Development Division, Hynix Semiconductor Inc.
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SONG Han-Sang
Memory Research and Development Division, Hynix Semiconductor Inc.
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PARK Ki-Seon
Memory Research and Development Division, Hynix Semiconductor Inc.
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Park Ki-seon
Memory R & D Division Hyundai Electronics Industries Co. Ltd.
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Park Ki-seon
Memory Research And Development Division Hynix Semiconductor Inc.
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Roh J‐s
Memory Research And Development Division Hynix Semiconductor Inc.
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Sun Ho-jung
Memory Research And Development Division Hynix Semiconductor Inc.
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Kim Y
Memory Research And Development Division Hynix Semiconductor Inc.
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Park Sung-eon
Memory Research And Development Division Hynix Semiconductor Inc.
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Kim Kyong-min
Memory R & D Division Hynix Semiconductor Inc.
著作論文
- Fabrication of Highly Dense Ru Thin Films by High-Temperature Metal-Organic Chemical Vapor Deposition with NH_3 Gas as Ru Oxidation Suppressing Agent
- Properties of Ru Thin Films Fabricated on TiN by Metal-Organic Chemical Vapor Deposition
- Oxidation Characteristics of TiN Film as a Barrier Metal for Bottom-Electrode Ru Film Fabricated from Tris-(2,4-octanedionato)ruthenium