KUNII Yasuo | Electrical Communication Laboratories, Nippon Telegraph and Telephone Corporation
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概要
関連著者
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KUNII Yasuo
Electrical Communication Laboratories, Nippon Telegraph and Telephone Corporation
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Kunii Yasuo
Electrical Communication Laboratories
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KAJIYAMA Kenji
Electrical Communication Laboratories
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Tabe Michiharu
Electrical Communication Laboratories
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HORIUCHI Shigeo
National Institute for Research in Inorganic Materials
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OHDOMARI Iwao
School of Science and Engineering, Waseda University
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Kawarada Hiroshi
School Of Science And Engineering Waseda University
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Kawarada Hiroshi
School Of Science & Engineering Waseda University
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大泊 巌
早大理工
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Ohdomari Iwao
School Of Science And Engineering Waseda University
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Ohdomari Iwao
School Of Science And Engineering Waseda University:kagami-memorial Laboratory For Materials Science
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Horiuchi S
National Inst. Res. In Inorganic Materials Tsukuba Jpn
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Horiuchi S
National Inst. Res. In Inorganic Materials Ibaraki Jpn
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Horiuchi Shigeo
National Institute For Research In Inorganic Materials (nirim)
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KUNII YASUO
Department of Surgery, Sendai National Hospital
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UENO Tomo
School of Science and Engineering, Waseda University
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Kawarada H
School Of Science And Engineering Waseda University
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Ueno T
Tokyo Univ. Agriculture And Technol. Tokyo Jpn
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Ueno Tomo
School Of Science And Engineering Waseda University
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Kunii Y
Institute Of Materials Science University Of Tsukuba
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Kunii Yasuo
Electrical Communication Laboratories Ntt
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Horiuchi S
National Institute For Research In Inorganic Materials
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IRITA Yukio
Electrical Communication Laboratories, NTT
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TAKAHASHI Mitsutoshi
Electrical Communication Laboratories, NTT
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Takahashi Mitsutoshi
Electrical Communication Laboratories Ntt
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Kawarada Hiroshi
Nanotechnology Research Center Waseda University
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Irita Yukio
Electrical Communication Laboratories Ntt
著作論文
- High-Resolution Electron Microscope Study of Silicon on Insulator Structure Grown by Lateral Solid Phase Epitaxy
- Lateral-Epitaxy of CVD a-Si over SiO_2 Stripe-Area by Furnace-Annealing : LATE NEWS
- Solid-Phase Epitaxy of CVD Amorphous Si Film on Crystalline Si
- Multiple SOI Structure Fabricated by High Dose Oxygen Implantation and Epitaxial Growth