Kajiyama Hiroshi | Hitachi Research Laboratory Hitachi Ltd.

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概要

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著作論文

Fabrication of High-Resolution and High-Aspect-Ratio Patterns on a Stepped Substrate by Using Scanning Probe Lithography with a Multilayer-Resist System
Fabrication of High-Resolution and High-Aspect-Ratio Patterning on a Stepped Substrate by Scanning Probe Lithography Using a Multilayer-Resist System
Characteristics of Nanoscale Lithography Using AFM with a Current-Controlled Exposure System
Characteristics of Nanoscale Lithography Using Atomic Force Microscope with Current-Controlled Exposure System
Initial Backbond Oxidation at an Unpaired Dangling Bond Site on a Hydrogen-Terminated Si (100) 2×1 Surface
Calculation of Bond Lengths in Si_Ge_x Alloys Based on the Valence-Force-Field Model
Secondary Electron Emission Characteristics of MgO Thin Films Prepared by an Advanced Ion-Plating Method
Ion-Plating Deposition of MgO Thin Films
Oxidation Mechanism of Ultra Thin TiN Films Prepared by an Advanced Ion-plating Method
Ultra Thin TiN Films Prepared by an Advanced Ion-Plating Method

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