UMEDA Yohtaro | NTT System Electronics Laboratories
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概要
関連著者
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UMEDA Yohtaro
NTT System Electronics Laboratories
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Umeda Y
Ntt Photonics Lab. Kanagawa Jpn
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ENOKI Takatomo
NTT System Electronics Laboratories
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Enoki Takatomo
Ntt Photonics Laboratories
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Umeda Yohtaro
Ntt Photonics Laboratories:(present Address)ntt Electronics Corporation
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YOKOYAMA Haruki
NTT System Electronics Laboratories
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ISHII Yasunobu
NTT System Electronics Laboratories
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Ishii Y
Waseda Univ. Tokyo Jpn
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Yokoyama H
Kddi R&d Laboratories Inc.
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Otsuji Taiichi
Ntt Network Innovation Laboratories
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Otsuji Taiichi
Ntt Optical Network Systems Laboratories
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Ishii Y
Yamaguchi Univ. Ube‐shi Jpn
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Otsuji T
Kyushu Inst. Of Technol. Iizuka‐shi Jpn
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SUEMITSU Tetsuya
NTT System Electronics Laboratories
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Suemitsu T
Ntt Photonics Lab. Kanagawa Jpn
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MURATA Koichi
NTT Optical Network Systems Laboratories
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YONEYAMA Mikio
NTT Optical Network Systems Laboratories
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Murata K
Ntt Photonics Laboratories
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OTSUJI Taiichi
Optical Network Systems Laboratories
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Ikuta K
Department Of Electronic Device Engineering Graduate School Of Information Science And Electrical En
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Ikuta Kenji
Ntt System Electronics Laboratories
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Murata K
Ntt Corp. Atsugi‐shi Jpn
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Yoneyama Mikio
Ntt Electronics Corporation
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OSAFUNE Kazuo
NTT System Electronics Laboratories
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Murata K
Ntt Photonics Laboratories Ntt Corporation
著作論文
- Exclusive OR/NOR IC for 40-Gbit/s Clock Recovery Circuit (Special Issue on Ultra-High-Speed IC and LSI Technology)
- Ultrahigh-Speed IC Technologies Using InP-Based HEMTs for Future Optical Communication Systems (Special Issue on Ultra-High-Speed IC and LSI Technology)
- Ultrahigh-Speed Integrated Circuits Using InP-Based HEMTs
- 49-GHz Operation of an SCFL Static Frequency Divider Using High-Speed Interconnections and InP-Based HEMTs (Special Issue on Microwave and Millimeter Wave Technology)
- Highly Stable Device Characteristics of InP-Based Enhancement-Mode High Electron Mobility Transistors with Two-Step-Recessed Gates
- Upper-bound Frequency for Measuring mm-Wave-Band Dielectric Characteristics of Thin Films on Semiconductor Substrates