CHA Han-Seob | R&D Center, MagnaChip Semiconductor Ltd.
スポンサーリンク
概要
関連著者
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CHA Han-Seob
R&D Center, MagnaChip Semiconductor Ltd.
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YUN Jang-Gn
Department of Electronics Engineering, Chungnam National University
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OH Soon-Young
Department of Electronics Engineering, Chungnam National University
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Kim Yong-Jin
Department of Internal Medicine, Cardiovascular Center, Seoul National University Hospital
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KIM Ui-Sik
R&D Center, MagnaChip Semiconductor Ltd.
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HEO Sang-Bum
R&D Center, MagnaChip Semiconductor Ltd.
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HUANG Bin-Feng
Department of Electronics Engineering, Chungnam National University
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Lee Hi-deok
Department Of Electronics Engineering Chungnam National University
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Wang Jin
Dept. Of Electronics Engineering Chungnam National University
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Wang Jin-suk
Department Of Electronics Engineering Chungnam National University
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Kim Ui
R&d Center Magnachip Semiconductor Ltd.
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Huh Sang
R&d Center Magnachip Semiconductor Ltd.
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Cha Han
R&d Center Magnachip Semiconductor Ltd.
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Lee H‐j
Magnachip Semiconductor Inc.
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Kim Y‐j
Magnachip Semiconductor Inc.
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LEE Jeong-Gun
R&D Center, MagnaChip Semiconductor Inc.
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Ji Hee-hwan
Department Of Electronics Engineering Chungnam National University
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Kim Yong-Jin
Department of Electronics Engineering, Chungnam National University, 220 Gung-Dong, Yuseong-gu, Daejeon 305-764, Korea
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Yun Jang-Gn
Department of Electronics Engineering, Chungnam National University, 220 Gung-Dong, Yuseong-gu, Daejeon 305-764, Korea
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Kim Yong
Magnachip Semiconductor Inc.
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Lee Hi-Deok
Dept. of Electronics Engineering, Chungnam National University
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JI Hee-Hwan
Magnachip Semiconductor Inc.
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LEE Heui-Seung
Magnachip Semiconductor Inc.
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JI Hee-Hwan
Dept. of Electronics Engineering, Chungnam National University
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WANG Jin-Suk
Dept. of Electronics Engineering, Chungnam National University
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JI Hee-Hwan
Department of Electronics Engineering, Chungnam National University
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WANG Jin-Suk
Department of Electronics Engineering, Chungnam National University
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LEE Hi-Deok
Department of Electronics Engineering, Chungnam National University
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YUN Jang-Gn
Dept. of Electronics Engineering, Chungnam National University
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OH Soon-Young
Dept. of Electronics Engineering, Chungnam National University
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KIM Yong-Jin
Dept. of Electronics Engineering, Chungnam National University
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Yun Jang‐gn
Inter-university Semiconductor Research Center And School Of Electrical Engineering And Computer Sci
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Cho Yoo-jeong
Dept. Of Materials Engineering Korea University Of Technology And Education
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Huang Bin
Department Of Electronics Engineering Chungnam National University
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Lee H‐j
Dept. Of Electronics Engineering Chungnam National University
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Lee Hi-deok
R&d Division Lg Semicon Co. Ltd.
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Lee Hi-deok
Dept. Of Electronics Engineering Chungnam National Univ.
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Wang Jin-suk
Dept. Of Electronics Engineering Chungnam National University
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Kim Y‐c
Magnachip Semiconductor Inc.
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Lee J‐g
System Ic R & D Division Hynix Semiconductor Inc.
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Agchbayar Tuya
Dept. Of Electronics Engineering Chungnam National University
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Lee Won-jae
Dept. Of Electronics Engineering Chungnam National University
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Lee Won-jae
Department Of Advanced Materials Engineering Dong-eui University
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Ji Hee
Dept. Of Electronics Engineering Chungnam National University
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Kim Yong-jin
Dept. Of Electronics Engineering Chungnam National University
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HAN Kil-Jin
Dept. Of Materials Engineering, Korea University of Technology and Education
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KIM Yeong-Cheul
Dept. Of Materials Engineering, Korea University of Technology and Education
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Han Kil-jin
Dept. Of Materials Engineering Korea University Of Technology And Education
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Ji Hee
Magnachip Semiconductor Inc.
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Kim Yong-goo
Electrical And Computer Engineering Chungnam National University
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Lee H‐d
Chungnam National Univ. Taejon Kor
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Kim Do-woo
Department Of Digital Design Korea Women's Polytechnic
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Yun Jang
Inter-university Semiconductor Research Center (isrc) And School Of Electrical Engineering And Compu
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Oh Soon
Dept. Of Electronics Engineering Chungnam National University
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Yur Jang-gn
School Of Electrical Engineering Seoul National University
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Lee Hi-Deok
Department of Electronics Engineering, Chungnam National University, 220 Gung-Dong, Yuseong-gu, Daejeon 305-764, Korea
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Heo Sang-Bum
R&D Center, MagnaChip Semiconductor Inc., Hyangjeong, Hungduk-Gu, Cheongju, Choongbuk 361-725, Korea
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Cho Yoo-Jeong
Department of Materials Engineering, Korea University of Technology and Education, Chungnam 330-708, Korea
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Tuya Agchbayar
Department of Electronics Engineering, Chungnam National University, 220 Gung-dong, Yuseong-gu, Daejeon 305-764, Korea
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Han Kil-Jin
Department of Materials Engineering, Korea University of Technology and Education, Chungnam 330-708, Korea
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Kim Yeong-Cheul
Department of Materials Engineering, Korea University of Technology and Education, Chungnam 330-708, Korea
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Lee Jeong-Gun
R&D Center, MagnaChip Semiconductor Inc., Hyangjeong, Hungduk-Gu, Cheongju, Choongbuk 361-725, Korea
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Wang Jin-Suk
Department of Electronics Engineering, Chungnam National University, 220 Gung-dong, Yuseong-gu, Daejeon 305-764, Korea
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Lee Won-Jae
Department of Electronics Engineering, Chungnam National University, 220 Gung-dong, Yuseong-gu, Daejeon 305-764, Korea
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Kim Ui-Sik
R&D Center, MagnaChip Semiconductor Inc., Hyangjeong, Hungduk-Gu, Cheongju, Choongbuk 361-725, Korea
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Kim Do-Woo
Department of Electronics Engineering, Chungnam National University, 220 Gung-dong, Yuseong-gu, Daejeon 305-764, Korea
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Ji Hee-Hwan
Department of Electronics Engineering, Chungnam National University, 220 Gung-Dong, Yuseong-gu, Daejeon 305-764, Korea
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Oh Soon-Young
Department of Electronics Engineering, Chungnam National University, 220 Gung-Dong, Yuseong-gu, Daejeon 305-764, Korea
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Cha Han-Seob
R&D Center, MagnaChip Semiconductor Inc., Hyangjeong, Hungduk-Gu, Cheongju, Choongbuk 361-725, Korea
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Cha Han-Seob
R&D Center, MagnaChip Semiconductor Ltd., Hyangjeong, Hungduk-gu, Cheongju, Choongbuk 361-725, Korea
著作論文
- Highly Thermal Immune Ni GermanoSilicide with Nitrogen-Doped Ni and Co/TiN Double Capping Layer for Nano-Scale CMOS Applications
- Novel Nitrogen Doped Ni Self-Alingned Silicide Process for Nanoscale Complementary Metal Oxide Semiconductor Technology
- Highly Thermal Immune Nitrogen-Doped Ni–Germanosilicide with Co/TiN Double Layer for Nano-Scale Complementary Metal Oxide Semiconductor Applications
- Novel Nitrogen Doped Ni Self-Alingned Silicide Process for Nanoscale Complementary Metal Oxide Semiconductor Technology