Nakaki Hiroshi | Department Of Chemistry Sophia University
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概要
関連著者
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Nakaki Hiroshi
Department Of Chemistry Sophia University
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Funakubo Hiroshi
Department of Innovative and Engineered Material, Tokyo Institute of Technology, Yokohama 226-8503, Japan
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Funakubo Hiroshi
Department Of Innovative And Engineered Materials
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Koda Seiichiro
Department Of Chemical Engineering Facutly Of Engineering The University Of Tokyo
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Uchida Hiroshi
Department Of Anesthesia Tottori Prefectural Central Hospital
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FUNAKUBO Hiroshi
Department of Innovative and Engineered Materials, Interdisciplinary Graduate School, Tokyo Institut
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Morioka Hitoshi
Application Scientist Xrd For Thin Film Bruker Axs K.k.
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Funakubo H
Dep. Of Innovative And Engineered Materials Tokyo Inst. Of Technol.
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Funakubo Hiroshi
Department Of Innovative And Engineered Materials Interdisciplinary Graduated School Of Science And
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Osada Minoru
Advanced Materials Laboratory National Institute For Materials Science
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Funakubo Hiroshi
Department Of Innovative And Engineered Materials Interdisciplinary Graduate School Of Science And E
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SAITO Keisuke
Application Laboratory
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NAKAKI Hiroshi
Department of Innovative and Engineered Materials, Interdisciplinary Graduate School of Science and
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IKARIYAMA Rikyu
Department of Innovative and Engineered Materials, Interdisciplinary Graduate School of Science and
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Saito K
Institute Of Industrial Science University Of Tokyo
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Nakaki Hiroshi
Department Of Innovative And Engineered Materials Interdisciplinary Graduate School Of Science And E
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舟窪 浩
東工大院総合理工学研究科
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Ikariyama Rikyu
Department Of Innovative And Engineered Materials Interdisciplinary Graduate School Of Science And E
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Fujisawa Hironori
Department Of Electrical Electronic And Computer Engineering Graduate School Of Engineering Hitneji
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Saito Kunio
Ntt Microsystem Integration Laboratories
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Katoda Takashi
Department Of Electronic And Photonic Systems Engineering Kochi University Of Technology
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Saito K
Application Laboratory
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Saito K
Akita Univ. Akita Jpn
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Saito Keisuke
Application Laboratory Bruker Axs
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Katoda Takashi
Department of Electronic and Photonic System Engineering, Kochi University of Technology, 185 Tosayamada-cho, Kami, Kochi 782-8502, Japan
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Morioka Hitoshi
Department of Innovative and Engineered Materials, Tokyo Institute of Technology
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YAMADA Tomoaki
Department of Innovative and Engineered Materials, Tokyo Institute of Technology
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Fujisawa Takashi
Department of Internal Medicine, Harima Hospital of Ishikawajima-Harima Heavy Industries, Health Ins
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KUROSAWA Toshiyuki
Bruker AXS
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Saito Keisuke
Application Laboratory Analytical Division Philips Japan Ltd.
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Funakubo Hiroshi
Department Of Innovative And Engineered Materials Tokyo Institute Of Technology
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Morioka Hitoshi
Department Of Gynecology Saiseikai Shimonoseki General Hospital
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Yamada Tomoaki
Department Of Innovative And Engineered Materials Tokyo Institute Of Technology
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Ueno Risako
Department Of Innovative And Engineered Materials Interdisciplinary Graduate School Of Science And E
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Nishida Ken
Department Of Electronic And Photonic Systems Engineering Kochi University Of Technology
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KUROSAWA Toshitaka
Komatsu Ltd.
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Fujisawa Takashi
Department Of Accelerator And Medical Physics National Institute Of Radiological Sciences
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藤沢 浩訓
Dep. Of Innovative And Engineered Materials Tokyo Inst. Of Technol.
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Yokoyama Shintaro
Department Of Innovative And Engineered Materials Interdisciplinary Graduate School Of Science And E
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Osada Minoru
Advanced Materials Laboratory, National Institute of Materials Science (NIMS), Tsukuba 305-0044, Japan
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Osada Minoru
Advanced Materials Laboratory, National Institute for Materials Science (NIMS), Tsukuba, Ibaraki 305-0044, Japan
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Yokoyama Shintaro
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, Yokohama 226-8503, Japan
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Morioka Hitoshi
Application Laboratory
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Uchida Hiroshi
Department of Chemistry, Sophia University, Chiyoda-ku, Tokyo 102-8554, Japan
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Funakubo Hiroshi
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, J2-1508, 4259 Nagatsuta-cho, Midori-ku, Yokohama 226-8502, Japan
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Funakubo Hiroshi
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, Yokohama 226-8503, Japan
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Nishida Ken
Department of Electronic and Photonic System Engineering, Kochi University, Kochi 782-8502, Japan
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Nishida Ken
Department of Communicating Engineering, National Defense Academy, Yokosuka, Kanagawa 239-8686, Japan
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Nishida Ken
Research Institution of Kochi University of Technology, Kochi 782-8502, Japan
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Funakubo Hiroshi
Department of Innovative Engineered Materials, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8502, Japan
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Yasui Shintaro
Department of Chemistry, Sophia University, 7-1 Kioi-cho, Chiyoda-ku, Tokyo 102-8554, Japan
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Nakaki Hiroshi
Department of Chemistry, Sophia University, Tokyo 102-8554, Japan
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Nakaki Hiroshi
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, Yokohama 226-8503, Japan
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Nakaki Hiroshi
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, J2-1508, 4259 Nagatsuta-cho, Midori-ku, Yokohama 226-8502, Japan
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Katoda Takashi
Department of Electronic and Photonic System Engineering, Kochi University, Kochi 782-8502, Japan
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Koda Seiichiro
Department of Chemistry, Sophia University, Chiyoda-ku, Tokyo 102-8554, Japan
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Ueno Risako
Department of Innovative Engineered Materials, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8502, Japan
著作論文
- Impact of 90゚-Domain Wall Motion in Pb(Zr_Ti_)O_3 Film on the Ferroelectricity Induced by an Applied Electric Field
- Thick Epitaxial Pb(Zr_,Ti_)O_3 Films Grown on (100)CaF_2 Substrates with Polar-Axis-Orientation
- Enhancement of Polarization Property of PZT Film by Ion-Substitution Using Rare-Earth Elements
- Ion Modification for Improvement of Insulating and Ferroelectric Properties of BiFeO3 Thin Films Fabricated by Chemical Solution Deposition
- Ferroelectric Properties of Dysprosium-Substituted Lead Zirconate Titanate Thin Films Fabricated by Chemical Solution Deposition
- Site Occupancy Analysis on the Enhancement in Dy-Substituted Pb(Zr,Ti)O3 Film
- Formation of BiFeO3–BiScO3 Thin Films and Their Electrical Properties