HIRABAYASHI Atsuo | Advanced Device Technology Laboratory, Fuji Electric Corporate Research & Development Ltd.
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概要
- 同名の論文著者
- Advanced Device Technology Laboratory, Fuji Electric Corporate Research & Development Ltd.の論文著者
関連著者
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Sumida Hitoshi
Advanced Device Technology Laboratory Fuji Electric Corporate Research & Development Ltd.
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HIRABAYASHI Atsuo
Advanced Device Technology Laboratory, Fuji Electric Corporate Research & Development Ltd.
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Sumida Hitoshi
Advanced Device Technology Laboratory Fuji Electric Corporate R Amp Ltd.
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Hirabayashi Atsuo
Advanced Device Technology Laboratory Fuji Electric Corporate R Amp Ltd.
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Sumida Hitoshi
Fuji Electric Co. Ltd.
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Sumida Hitoshi
Advanced Device Technology Laboratory Fuji Electric Corporate R&d Ltd.
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Sumida H
Fuji Electric Co. Ltd. Nagano Jpn
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Sumida Hitoshi
Advanced Device Technology Laboratory Fuji Electric Corporate Research And Development Ltd.
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TAGAMI Saburou
Matsumoto Factory, Fuji Electric Company, Ltd.
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Hirabayashi Atsuo
Fuji Electric Co. Ltd.
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Hirabayashi Atsuo
Advanced Device Technology Laboratory Fuji Electric Corporate Research And Development Ltd.
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Hirabayashi Atsuo
Advanced Device Technology Laboratory Fuji Electric Corporate R&d Ltd.
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Hirabayashi Atsuo
Advanced Device Technology Laboratory Fuji Electric Corporate Research & Development Ltd.
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Tagami S
Matsumoto Factory Fuji Electric Company Ltd.
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Sumida Hitoshi
Advanced Device Technology Laboratory, Fuji Electric Corporate Research and Development, Ltd.
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SUMIDA Hitoshi
Advanced Device Technology Laboratory, Fuji Electric Corporate R&D, Ltd.
著作論文
- Measurements of the Breakdown Voltage of the Lateral Insulated Gate Bipolar Transistor on the Silicon-on-Insulator Film with Varying Implantation Doses for the N-Buffer Layer
- SOI LIGBT Structure with the Collector-Short Region for Improved Latch-Up Performance
- Investigation of Transient Substrate Currents in Lateral Power Devices on Silicon-on-Insulator
- Noise Current Induced by Switching of a Dielectric Isolated Lateral Insulated Gate Bipolar Transistor on Silicon-on-Insulator
- A Lateral Insulated Gate Bipolar Transistor Structure with the Collector-Short Region for Improved Latch-Up Performance
- Measurement of the Breakdown Voltage of Lateral Power Metal-Oxide-Semiconductor Field-Effect-Transistors on a Silicon-on-Insulator Film with Varying the Surface Design around the Gate Region
- Lateral IGBT Structure on the SOI Film with the Collector-Short Region for Improved Blocking Capability