IGARASHI Yasushi | Semiconductor Tech. Lab., Oki Electric Industry Co., Ltd.
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概要
Semiconductor Tech. Lab., Oki Electric Industry Co., Ltd. | 論文
- Improvement of the Interface between Selectively Deposited Aluminum and Silicon by Annealing
- Formation of c-Axis-Oriented Bi_4Ti_3O_ Films with Extremely Flat Surface by Spin-Coating
- Formation of c-Axis-Oriented Bi_4Ti_3O_ Films with Extremely Flat Surface by Spin-Coating
- Submicron Ferroelectric Capacitors Fabricated by Chemical Mechanical Polishing Process for High-Density Ferroelectric Memories
- Submicron Ferroelectric Capacitors Fabricated by CMP Process for High-Density FeRAMs