HONG Franklin | Department of Chemical Engineering National Cheng Kung University
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概要
関連著者
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HONG Franklin
Department of Chemical Engineering National Cheng Kung University
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Hong Franklin
Department of chemical engineering and Micro/Nano Science and Technology Center, National Cheng Kung University, 1 University Road, Tainan, Taiwan 701, Republic of China
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LIANG Gou-Tsau
Department of Chemical Engineering, National Cheng-Kung University
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HSU Chia-Yuan
Department of Chemical Engineering, National Cheng-Kung University
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Liang Gou-tsau
Department Of Chemical Engineering National Cheng-kung University
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Hsu Chia-yuan
Department Of Chemical Engineering National Cheng-kung University
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HSU Yung-Lung
VLSI Technology Laboratory, Institute of Microelectronics, Department of Electrical Engineering, Nat
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FANG Yean-Kuen
VLSI Technology Laboratory, Institute of Microelectronics, Department of Electrical Engineering, Nat
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CHIANG Yen-Ting
VLSI Technology Laboratory, Institute of Microelectronics, Department of Electrical Engineering, Nat
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CHOU Tse-Heng
VLSI Technology Laboratory, Institute of Microelectronics, Department of Electrical Engineering, Nat
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Hsu Yung-lung
Vlsi Technology Laboratory Institute Of Microelectronics Department Of Electrical Engineering Nation
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Hong F
National Cheng Kung Univ. Tainan Twn
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Hong Franklin
Department Of Chemical Engineering National Cheng-kung University
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Chou Tse-heng
Vlsi Technology Laboratory Institute Of Microelectronics Department Of Electrical Engineering Nation
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Fang Yean-kuen
Vlsi Technology Laboratory Institute Of Microelectronics Department Of Electrical Engineering Nation
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Fang Yean-kuen
Vlsi Technology Lab. Institute Of Microelectronics Ee Department National Cheng Kung University No.
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Chiang Yen-ting
Vlsi Technology Laboratory Institute Of Microelectronics Department Of Electrical Engineering Nation
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Guo Yoou-bin
Department Of Chemical Engineering National Cheng Kung University
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Liang G‐t
Department Of Chemical Engineering National Cheng-kung University
著作論文
- Mechanism of Chemical Mechanical Planarization Induced Edge Corrosion of Copper Line for Cu/Low-k SiOC Interconnects
- Characteristics of large-Area Cold Atmospheric Discharges from Radio-Frequency Microdischarge Arrays
- Characterization of Dual Hollow Cathode Arc Chemical Vapor Deposition by Optical Emission Spectroscopy
- Deposition of Micro-Crystalline β-C_3N_4 Films by an Inductively-Coupled-Plasma (ICP) Sputtering Method
- Enhanced Growth of β-C_3N_4 Crystallites at a High Substrate Temperature
- Diamond Growth by Dual Hollow Cathode Arc Chemical Vapor Deposition