Kobayashi Kiyoteru | Process Technology Development Division, Renesas Technology Corp.
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概要
- Eimori Takahisaの詳細を見る
- 同名の論文著者
- Process Technology Development Division, Renesas Technology Corp.の論文著者
Process Technology Development Division, Renesas Technology Corp. | 論文
- Local Bonding Structure of High-Stress Silicon Nitride Film modified by UV Curing for Strained-Silicon Technology beyond 45nm Node SoC Devices
- Study of Stress from Discontinuous SiN Liner for Fully-Silicided Gate Process
- Low temperature divided CVD technique for TiN metal gate electrodes of p-MISFETs
- A New Divided Deposition Method of TiN Thin Films for MIM Capacitor Applications
- Investigation of the Divided Deposition Method of TiN Thin Films for Metal–Insulator–Metal Capacitor Applications