Gas Cluster Ion Beam Etching under Acetic Acid Vapor for Etch-Resistant Material (Special Issue : Dry Process)
スポンサーリンク
概要
著者
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Yamaguchi Akira
Graduate School of Material Science, University of Hyogo, Kamigori, Hyogo 678-1297, Japan
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Toyoda Noriaki
Graduate School of Engineering, University of Hyogo, 2167 Shosha, Himeji, Hyogo 671-2201, Japan
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Hara Ken-ichi
Tokyo Electron, Technology Development Center, Tsukuba, Ibaraki 305-0841, Japan
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Hinoura Ryo
Graduate School of Engineering, University of Hyogo, Himeji, Hyogo 671-2280, Japan
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Yamada Isao
Graduate School of Engineering, University of Hyogo, 2167 Shosha, Himeji, Hyogo 671-2201, Japan
関連論文
- Photoelectron Spectroscopy Study of the Valence Band Region in Diamond-Like Carbon Thin Films
- Surface Smoothing of Polycrystalline Substrates with Gas Cluster Ion Beams
- Origin of High-T_{\text{c}} Inclusion in Noncentrosymmetric Superconductor CePt3Si
- Josephson Effect between Noncentrosymmetric LaPt3Si and a Conventional Superconductor
- X-ray Photoelectron Spectroscopy Study of Diamond-Like Carbon Thin Films Formed by Ar Gas Cluster Ion Beam-Assisted Fullerene Deposition
- Development of Cu Etching Using O Cluster Ion Beam under Acetic Acid Gas Atmosphere (Special Issue : Dry Process)
- Measurement of the Josephson Effect of Heavy-Fermion Superconductor UPt3 as a Test of the Odd-Parity Order Parameter
- Gas Cluster Ion Beam Etching under Acetic Acid Vapor for Etch-Resistant Material
- Irradiation Effects of Gas Cluster Ion Beams on Co--Fe Films
- Gas Cluster Ion Beam Etching under Acetic Acid Vapor for Etch-Resistant Material (Special Issue : Dry Process)