Gas Cluster Ion Beam Etching under Acetic Acid Vapor for Etch-Resistant Material

スポンサーリンク

概要

• 論文の詳細を見る

• Gas cluster ion beam (GCIB) etching of etch-resistant materials under acetic acid vapor was studied for development of new manufacturing process of future nonvolatile memory. Etching depths of various etch-resistant materials (Pt, Ru, Ta, CoFe) with acetic acid vapor during O<inf>2</inf>-GCIB irradiations were 1.8--10.7 times higher than those without acetic acid. Also, etching depths of Ru, Ta, CoFe by Ar-GCIB with acetic acid vapor were 2.2--16.1 times higher than those without acetic acid. Even after etching of Pt, smoothing of Pt was realized using O<inf>2</inf>-GCIB under acetic acid. From XPS and angular distribution of sputtered Pt, it was shown that PtO<inf>x</inf>layer was formed on Pt after O<inf>2</inf>-GCIB irradiation. PtO<inf>x</inf>reacted with acetic acid by GCIB bombardments; as a result, increase of etching depth was observed.

• 2013-05-25

著者

• Yamaguchi Akira

  Graduate School of Material Science, University of Hyogo, Kamigori, Hyogo 678-1297, Japan

• Yamada Isao

  Graduate School of Engineering, University of Hyogo, 2167 Syosya, Himeji, Hyogo 671-2201, Japan

• Toyoda Noriaki

  Graduate School of Engineering, University of Hyogo, 2167 Shosha, Himeji, Hyogo 671-2201, Japan

• Toyoda Noriaki

  Graduate School of Engineering, University of Hyogo, Himeji, Hyogo 671-2280, Japan

• Hara Ken-ichi

  Tokyo Electron, Technology Development Center, Tsukuba, Ibaraki 305-0841, Japan

• Hinoura Ryo

  Graduate School of Engineering, University of Hyogo, Himeji, Hyogo 671-2280, Japan

関連論文

• Photoelectron Spectroscopy Study of the Valence Band Region in Diamond-Like Carbon Thin Films
• Surface Smoothing of Polycrystalline Substrates with Gas Cluster Ion Beams
• Origin of High-T_{\text{c}} Inclusion in Noncentrosymmetric Superconductor CePt3Si
• Josephson Effect between Noncentrosymmetric LaPt3Si and a Conventional Superconductor
• X-ray Photoelectron Spectroscopy Study of Diamond-Like Carbon Thin Films Formed by Ar Gas Cluster Ion Beam-Assisted Fullerene Deposition
• Development of Cu Etching Using O Cluster Ion Beam under Acetic Acid Gas Atmosphere (Special Issue : Dry Process)
• Measurement of the Josephson Effect of Heavy-Fermion Superconductor UPt3 as a Test of the Odd-Parity Order Parameter
• Gas Cluster Ion Beam Etching under Acetic Acid Vapor for Etch-Resistant Material
• Irradiation Effects of Gas Cluster Ion Beams on Co--Fe Films
• Gas Cluster Ion Beam Etching under Acetic Acid Vapor for Etch-Resistant Material (Special Issue : Dry Process)

スポンサーリンク