Irradiation Effects of Gas Cluster Ion Beams on Co--Fe Films
スポンサーリンク
概要
- 論文の詳細を見る
Irradiation effects of gas cluster ion beam (GCIB) were studied on Co<inf>3</inf>Fe<inf>7</inf>films as a novel etching process. Etching depth of Co<inf>3</inf>Fe<inf>7</inf>increased with increasing the acceleration voltage (V_{\text{a}}) and the ionization electron voltage (V_{\text{e}}), however, there is a tradeoff between etching rate and the surface roughness. Because multiply charged GCIBs were formed at high V_{\text{e}} (200 V), the surface layer and interface became rough. When low V_{\text{e}} (50 V) was applied for ionization of Ar-GCIB, crystalline CoFe<inf>2</inf>O<inf>4</inf>layer (10 nm thick) was formed by Ar-GCIB irradiations at room temperature. Oxidation was due to water vapors during GCIB irradiation, which will be eliminated in ultra high vacuum. It is expected that gentle etching of magnetic films is possible with Ar-GCIB ionized at low V_{\text{e}}.
- 2013-06-25
著者
-
Yamada Isao
Graduate School of Engineering, University of Hyogo, 2167 Syosya, Himeji, Hyogo 671-2201, Japan
-
Toyoda Noriaki
Graduate School of Engineering, University of Hyogo, 2167 Shosha, Himeji, Hyogo 671-2201, Japan
-
Fujimoto Akihiro
Graduate School of Engineering, University of Hyogo, Himeji, Hyogo 671-2280, Japan
関連論文
- Photoelectron Spectroscopy Study of the Valence Band Region in Diamond-Like Carbon Thin Films
- Surface Smoothing of Polycrystalline Substrates with Gas Cluster Ion Beams
- X-ray Photoelectron Spectroscopy Study of Diamond-Like Carbon Thin Films Formed by Ar Gas Cluster Ion Beam-Assisted Fullerene Deposition
- Development of Cu Etching Using O Cluster Ion Beam under Acetic Acid Gas Atmosphere (Special Issue : Dry Process)
- Gas Cluster Ion Beam Etching under Acetic Acid Vapor for Etch-Resistant Material
- Irradiation Effects of Gas Cluster Ion Beams on Co--Fe Films
- Co-occurrence of Heterocapsa Circularisquama Bloom and Its Lytic Viruses in Lake Kamo, Japan, 2010
- Gas Cluster Ion Beam Etching under Acetic Acid Vapor for Etch-Resistant Material (Special Issue : Dry Process)