Novel precursors for SiCH low-k caps beyond the 22nm node: reactions of silacyclopentane precursors in the plasma-enhanced chemical vapor deposition process and structural analyses of SiCH films (Special issue: Dry process)

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概要

• 論文の詳細を見る

著者

• Tajima Nobuo

  First Principles Simulation Group Computational Materials Science Center National Institute For Mate

関連論文

• Isobutyl silane precursors for SiCH low-k cap layer beyond the 22nm node: analysis of film structure for compatibility of lower k-value and high barrier properties (Special issue: Advanced metallization for ULSI applications)
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• Novel precursors for SiCH low-k caps beyond the 22nm node: reactions of silacyclopentane precursors in the plasma-enhanced chemical vapor deposition process and structural analyses of SiCH films (Special issue: Dry process)
• Supramolecular Chirality Measurement of an Optically Anomalous Single Crystal
• Carbon-Doped Silicon Oxide Films with Hydrocarbon Network Bonds for Low-$k$ Dielectrics: Theoretical Investigations

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