Resist pattern inspection using fluorescent dye-doped polystyrene thin films in reactive-monolayer-assisted thermal nanoimprint lithography (Special issue: Microprocesses and nanotechnology)
スポンサーリンク
概要
著者
-
Sato Yuko
Institute Of Multidisciplinary Research For Advanced Materials Tohoku University
-
NAKAGAWA Masaru
Institute of Multidisciplinary Research for Advanced Materials (IMRAM), Tohoku University
-
Kubo Shoichi
Institute of Multidisciplinary Research for Advanced Materials (IMRAM), Tohoku University, Sendai 980-8577, Japan
-
Hirai Yoshihiko
Japan Science and Technology Agency (JST), Core Research Evolutional Science and Technology (CREST), Chiyoda, Tokyo 102-0075, Japan
関連論文
- Resist pattern inspection using fluorescent dye-doped polystyrene thin films in reactive-monolayer-assisted thermal nanoimprint lithography (Special issue: Microprocesses and nanotechnology)
- Critical Role of Val567 in Substrate Recognition by Neuronal Nitric Oxide Synthase for NO Formation Activity
- Growth Behavior of an Adsorbed Monolayer from a Benzophenone-Containing Trimethoxysilane Derivative on a Fused Silica Surface for Nanoimprint Molds by Chemical Vapor Surface Modification
- Silica/Ultraviolet-Cured Resin Nanocomposites for Replica Molds in Ultraviolet Nanoimprinting (Special Issue : Microprocesses and Nanotechnology)
- Thermal Nanoimprint of a Polystyrene and Poly(4-vinylpyridine) Double-Layer Thin Film and Visualization Determination of Its Internal Structure by Transmission Electron Microscopy
- Resist Properties of Thin Poly(methyl methacrylate) and Polystyrene Films Patterned by Thermal Nanoimprint Lithography for Au Electrodeposition
- Step and Repeat Ultraviolet Nanoimprinting under Pentafluoropropane Gas Ambient
- Optically Transparent and Refractive Index-Tunable ZrO2/Photopolymer Composites Designed for Ultraviolet Nanoimprinting
- Fluorescent Microscopy Proving Resin Adhesion to a Fluorinated Mold Surface Suppressed by Pentafluoropropane in Step-and-Repeat Ultraviolet Nanoimprinting
- Surface Segregation of 1H,1H,9H-Hexadecafluorononyl Acrylate in Dimethacrylate Resin Films Cured by Exposure to Ultraviolet Light
- Gold Mesh Structures with Controlled Aperture Ratios Fabricated by Reactive-monolayer-assisted Thermal Nanoimprint Lithography
- Study of Demolding Characteristics in Step-and-Repeat Ultraviolet Nanoimprinting
- Resolution Limits of Nanoimprinted Patterns by Fluorescence Microscopy (Special Issue : Microprocesses and Nanotechnology)