Effect of electron density on extreme ultraviolet output of a Z-pinch Xe discharge produced plasma source (Special issue: Microprocesses and nanotechnology)

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概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文

著者

• HUANG Bin

  Tokyo Institute of Technology

関連論文

• Xe-based Z-pinch Discharged Produced Plasma (DPP) EUV Source for Lithography
• Xe-based gas jet type Z-pinch DPP EUV source for lithography
• Effect of electron density on extreme ultraviolet output of a Z-pinch Xe discharge produced plasma source (Special issue: Microprocesses and nanotechnology)
• Study of the initial gas distribution of a Z pinch Xe Discharge Produced Plasma source
• Xe-based gas jet type Z-pinch DPP EUV source for lithography
• Study of the initial gas distribution of a Z pinch Xe Discharge Produced Plasma source

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