Xe-based Z-pinch Discharged Produced Plasma (DPP) EUV Source for Lithography
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概要
- 論文の詳細を見る
- 2010-02-23
著者
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WATANABE Masato
Tokyo Institute of Technology
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HOTTA Eiki
Tokyo Institute of Technology
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Hotta Eiki
Department Of Physical Electronics Tokyo Institute Of Technology
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HUANG Bin
Tokyo Institute of Technology
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TAKIMOTO Yasuhiro
Tokyo Institute of Technology
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Watanabe Masato
Tokyo City University, Setagaya, Tokyo 158-8557, Japan
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