HUANG Bin | Tokyo Institute of Technology
スポンサーリンク
概要
関連著者
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HUANG Bin
Tokyo Institute of Technology
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HOTTA Eiki
Tokyo Institute of Technology
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Watanabe Masato
Tokyo City University, Setagaya, Tokyo 158-8557, Japan
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WATANABE Masato
Tokyo Institute of Technology
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Hotta Eiki
Department Of Physical Electronics Tokyo Institute Of Technology
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TAKIMOTO Yasuhiro
Tokyo Institute of Technology
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Xie Bin
Tokyo Institute Of Technology
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TOMIZUKA Taku
Tokyo Institute of Technology
著作論文
- Xe-based Z-pinch Discharged Produced Plasma (DPP) EUV Source for Lithography
- Xe-based gas jet type Z-pinch DPP EUV source for lithography
- Effect of electron density on extreme ultraviolet output of a Z-pinch Xe discharge produced plasma source (Special issue: Microprocesses and nanotechnology)
- Study of the initial gas distribution of a Z pinch Xe Discharge Produced Plasma source
- Xe-based gas jet type Z-pinch DPP EUV source for lithography
- Study of the initial gas distribution of a Z pinch Xe Discharge Produced Plasma source