Study of the initial gas distribution of a Z pinch Xe Discharge Produced Plasma source
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概要
- 論文の詳細を見る
- 2011-12-15
著者
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HOTTA Eiki
Tokyo Institute of Technology
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HUANG Bin
Tokyo Institute of Technology
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Xie Bin
Tokyo Institute Of Technology
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Watanabe Masato
Tokyo City University, Setagaya, Tokyo 158-8557, Japan
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TOMIZUKA Taku
Tokyo Institute of Technology
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- NOx TREATMENT USING LOW-ENERGY SECONDARY EMISSION ELECTRON GUN
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- Extreme-ultraviolet Intensity of Discharge-based Lithium Plasma for Lithography
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- Effects of Ti rod cathode in a magnetic-assisted electrostatic confinement (MEC) fusion device
- Study of High-\kappa/In0.53Ga0.47As Interface by Hard X-ray Photoemission Spectroscopy
- Xe-based gas jet type Z-pinch DPP EUV source for lithography
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- Effects of Ti rod cathode in a magnetic-assisted electrostatic confinement (MEC) fusion device