Impact of Thin Island-Like BaSi2 Template on the Formation of n+-BaSi2/p+-Si Tunnel Junction on Si(111) Surface by Molecular Beam Epitaxy
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概要
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We have grown n+-BaSi2/p+-Si tunnel junctions with different BaSi2 template layer thicknesses by molecular beam epitaxy. Even when the template layer was 1 nm in thickness, which was not actually a continuous film but small islands, they act as seed crystals for the initiation of overlayer growth. The electrical resistance of the junctions increased with template thickness. Both epitaxial growth and low resistance were achieved for thin island-like BaSi2 templates.
- 2010-06-25
著者
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Michitoshi Takeishi
Institute of Applied Physics, University of Tsukuba, 1-1-1 Tennohdai, Tsukuba, Ibaraki 305-8573, Japan
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Takanobu Saito
Institute of Applied Physics, University of Tsukuba, 1-1-1 Tennohdai, Tsukuba, Ibaraki 305-8573, Japan
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Takashi Suemasu
Institute of Applied Physics, University of Tsukuba, 1-1-1 Tennodai, Tsukuba, Ibaraki 305-8573, Japan
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Yuta Matsumoto
Institute of Applied Physics, University of Tsukuba, 1-1-1 Tennohdai, Tsukuba, Ibaraki 305-8573, Japan
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Ryo Sasaki
Institute of Applied Physics, University of Tsukuba, 1-1-1 Tennohdai, Tsukuba, Ibaraki 305-8573, Japan
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Ryo Sasaki
Institute of Applied Physics, University of Tsukuba, Tsukuba, Ibaraki 305-8573, Japan
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Yuta Matsumoto
Institute of Applied Physics, University of Tsukuba, Tsukuba, Ibaraki 305-8573, Japan
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Michitoshi Takeishi
Institute of Applied Physics, University of Tsukuba, Tsukuba, Ibaraki 305-8573, Japan
関連論文
- Impact of Thin Island-Like BaSi2 Template on the Formation of n+-BaSi2/p+-Si Tunnel Junction on Si(111) Surface by Molecular Beam Epitaxy
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