Fabrication of Active Light-Emitting Device Combined with ZnO Transistors
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概要
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Organic light-emitting diodes (OLEDs) have received much attention owing to their flexibility, low cost, and ease of processing. Although the active matrix display is a suitable system for what transistors and OLEDs with a large aperture ratio should be fabricated in each pixel. In this work, as one of the methods of expanding effective light-emitting area for active matrix displays, a new type of active light-emitting device combined with a ZnO transistor is proposed. The low-temperature, low-damage sputtering method improves on current by two orders of magnitude. A luminance of the active light-emitting device driven by ZnO transparent field-effect transistor (FET) was obtained. We fabricated a device with ZnO transparent FET and reported the electrical properties of ZnO FET.
- 2009-04-25
著者
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Iizuka Masaaki
Faculty Of Education Chiba University
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NAKAMURA Masakazu
Graduate School of Engineering, Chiba University
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Watanabe Yasuyuki
Center For Frontier Science Chiba University
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Kudo Kazuhiro
Graduate School Of Engineering Chiba University
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Yamauchi Hiroshi
Faculty Of Engineering Ehime University
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Watanabe Yasuyuki
Center of Frontier Science, Chiba University, 1-33 Yayoi, Inage, Chiba 263-8522, Japan
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Nakamura Masakazu
Graduate School of Engineering, Chiba University, 1-33 Yayoi, Inage, Chiba 263-8522, Japan
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Yamauchi Hiroshi
Faculty of Engineering, Chiba University, 1-33 Yayoi, Inage, Chiba 263-8522, Japan
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