Selective Patterning of Organic Light-Emitting Diodes by Physical Vapor Deposition of Photosensitive Materials
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概要
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A novel method of patterning polymeric thin films by the vapor deposition of a photosensitive layer followed by photopolymerization and development was proposed. This method was applied to the patterning of the emissive layer (EML) of an organic light-emitting diode (OLED). For the hole transport layer (HTL), N,N,N$'$-triphenyl-N$'$-(4-vinylphenyl)-biphenyl-4,4$'$-diamine (vTPD) and a zinc acrylate (ZnAc) crosslinker were coevaporated. The film was polymerized by postdeposition annealing to yield a polymeric HTL with a high resistance to organic solvents. On this HTL, the photosensitive EML was prepared by coevaporating a $9H$-carbazole-9-ethylmethacrylate (CEMA) host material and 4-(dimethylamino)benzophenone (DABP) photoinitiator. UV irradiation on the EML through a photomask initiated radical polymerization, leaving a negative pattern of the irradiated region after immersion in tetrahydrofuran (THF). The photopatterning process was found to cause no damage to the film morphology or the device characteristics.
- 2009-04-25
著者
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Usui Hiroaki
Tokyo Institute Of Technology Department Of Textile And Polymeric Materials
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Yokokura Seiji
Tokyo Univ. Agriculture And Technol. Tokyo Jpn
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Muroyama Masakazu
Sony Corp. Kanagawa Jpn
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Tanaka Kuniaki
Tokyo Univ. Agriculture And Technol. Tokyo Jpn
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Saito Ichiro
Sony Corporation Atsugi Technology Center No.2
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Muroyama Masakazu
SONY Corporation, Advanced Materials Laboratories, 4-16-1 Okata, Atsugi, Kanagawa 243-0021, Japan
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Yokokura Seiji
Tokyo University of Agriculture and Technology, Department of Organic and Polymer Materials Chemistry, 2-24-16 Nakamachi, Koganei, Tokyo 184-8588, Japan
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Saito Ichiro
SONY Corporation, Advanced Materials Laboratories, 4-16-1 Okata, Atsugi, Kanagawa 243-0021, Japan
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Tanaka Kuniaki
Tokyo University of Agriculture and Technology, Department of Organic and Polymer Materials Chemistry, 2-24-16 Nakamachi, Koganei, Tokyo 184-8588, Japan
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