Polymeric Film Deposition by Coevaporation of Polymerizable Monomer and Initiator
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概要
- 論文の詳細を見る
A novel method for patterning polymeric thin films by vapor deposition of a photosensitive layer followed by photopolymerization and development was proposed. Organic film patterns were obtained by selective polymerization of photosensitive layers that were prepared by coevaporating photoinitiators of either 4-(dimethylamino)benzophenone (DABP) or IRUGACURE 907 (IRU) with a functional monomer of 2-(9H-carbazol-9-yl)ethylmethacrylate (CAR). IR analysis confirmed that these materials can be vapor-deposited without decomposition. After the selective polymerization by UV irradiation through a photomask, the film was patterned by removing the nonpolymerized section using tetrahydrofuran. 10 μm dot patterns were obtained with this method, indicating a structure controllability of the micron scale. The effects of irradiation power and initiator concentration were compared between DABP and IRU. This method is advantageous as a new technique for patterning polymer films without using a shadow mask for vapor deposition or a photoresist.
- 2010-01-25
著者
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Usui Hiroaki
Tokyo Institute Of Technology Department Of Textile And Polymeric Materials
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Yokokura Seiji
Tokyo Univ. Agriculture And Technol. Tokyo Jpn
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Muroyama Masakazu
Sony Corp. Kanagawa Jpn
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Tanaka Kuniaki
Tokyo Univ. Agriculture And Technol. Tokyo Jpn
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