Enhanced Fabry–Perot Interferences from Nanoporous Surfaces of GaN Thin Films Patterned by Anodic Alumina Templates
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概要
- 論文の詳細を見る
The authors fabricated a nanoporous alumina template with an electrochemical anodization process and implemented this template as a mask for the nanopatterning process onto the GaN surface of an InGaN/GaN multi-quantum-well structure. The fabricated nanohole structure shows a locally ordered periodicity of a photonic crystal slab with an averaged hole distance of 105 nm and hole diameter of 60 nm. The nanohole array as a subwavelength grating shows an enhanced intensity peak at 454.8 nm with enhanced optical interference indicating the formation of subwavelength nanohole diffraction grating.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2008-08-25
著者
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WOO Deok
Photonic Research Center, Korea Institute of Science and Technology
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Woo Deok
Photonic Research Center, Korea Institute of Science and Technology, Seoul 110-756, Republic of Korea
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Kim Keunjoo
Department of Mechanical Engineering and Research Center for Industrial Technology, Chonbuk National University, Jeonju 561-756, Republic of Korea
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Choi Jaeho
Department of Mechanical Engineering and Research Center for Industrial Technology, Chonbuk National University, Jeonju 561-756, Republic of Korea
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Jung Mi
Photonic Research Center, Korea Institute of Science and Technology, Seoul 110-756, Republic of Korea
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Choi Jaeho
Department of Mechanical Engineering and Research Center of Industrial Technology, Chonbuk National University, Jeonju 561-756, Republic of Korea
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Kim Keunjoo
Department of Mechanical Engineering and Research Center of Industrial Technology, Chonbuk National University, Jeonju 561-756, Republic of Korea
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