Multilayer Disk Reduced Interlayer Crosstalk with Wide Disk-Fabrication Margin
スポンサーリンク
概要
- 論文の詳細を見る
To reduce interlayer crosstalk caused by the ghost spot which appears in a multilayer optical disk with more than three information layers, a multilayer disk structure which reduces interlayer crosstalk with a wide disk-fabrication margin was proposed in which the backward reflectivity of the information layers is sufficiently low. It was confirmed that the interlayer crosstalk caused by the ghost spot was reduced to less than the crosstalk from the adjacent layer by controlling backward reflectivity. The wide disk-fabrication margin of the proposed disk structure was indicated by experimentally confirming that the tolerance of the maximum deviation of the spacer-layer thickness is four times larger than that in the previous multilayer disk.
- 2008-07-25
著者
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Ushiyama Junko
Central Research Laoratory Hitachi Ltd.
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Shintani Toshimichi
Central Research Laboratory Hitachi Ltd.
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Anzai Yumiko
Central Research Laboratory Hitachi Ltd.
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Hirotsune Akemi
Central Research Laboratory Hitachi Ltd.
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Kurokawa Takahiro
Central Research Laboratory. Hitachi Ltd.
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Miyamoto Harukazu
Central Research Laboratory Hitachi Ltd.
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Miyauchi Yasushi
R&D Division, Development & Technology Group, Hitachi Maxell Ltd., 6139-1 Ohnogo, Joso, Ibaraki 300-2595, Japan
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Miyauchi Yasushi
R&D Division, Development & Technology Group, Hitachi Maxell Ltd., 6139-1 Ohnogo, Joso, Ibaraki 300-2595, Japan
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Sugiyama Toshinori
R&D Division, Development and Technology Group, Hitachi Maxell, Ltd., Joso, Ibaraki 300-2595, Japan
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Endo Nobumasa
R&D Division, Development & Technology Group, Hitachi Maxell Ltd., 6139-1 Ohnogo, Joso, Ibaraki 300-2595, Japan
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Onuma Tsuyoshi
R&D Division, Development & Technology Group, Hitachi Maxell Ltd., 6139-1 Ohnogo, Joso, Ibaraki 300-2595, Japan
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Endo Nobumasa
R&D Division, Development & Technology Group, Hitachi Maxell Ltd., 6139-1 Ohnogo, Joso, Ibaraki 300-2595, Japan
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Sugiyama Toshinori
R&D Division, Development & Technology Group, Hitachi Maxell Ltd., 6139-1 Ohnogo, Joso, Ibaraki 300-2595, Japan
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Onuma Tsuyoshi
R&D Division, Development & Technology Group, Hitachi Maxell Ltd., 6139-1 Ohnogo, Joso, Ibaraki 300-2595, Japan
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Ushiyama Junko
Central Research Laboratory, Hitachi, Ltd., 1-280 Higashi-Koigakubo, Kokubunji, Tokyo 185-8601, Japan
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Kurokawa Takahiro
Central Research Laboratory, Hitachi, Ltd., 1-280 Higashi-Koigakubo, Kokubunji, Tokyo 185-8601, Japan
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