Local Self-Heating of Pyrolyzed Polymer Microstructure for Further Carbonization at Higher Temperature on Silicon Chip

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概要

• 論文の詳細を見る

• In this paper, we present the local self-heating of a pyrolyzed polymer microstructure on a silicon substrate by resistive heating for further carbonization at higher temperature. It becomes difficult to pyrolyze polymers on substrates above 1100 °C because the substrates or other materials are thermally damaged. In order to address this restriction, we propose a multistep pyrolysis. A patterned polymer structure is converted to a conductive pyrolyzed polymer by a furnace process at low temperature. The pyrolyzed polymer structure carbonizes itself by resistive heating as the final process. We have successfully demonstrated the proposed method. The obtained material was characterized by electrical resistance measurement and Raman microspectroscopy.

• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2008-12-25

著者

• Konishi Satoshi

  Department Micro System Technology Faculty Of Science And Engineering Ritsumeikan University

• Naka Keisuke

  The Graduate School of Science and Engineering, Ritsumeikan University, Kusatsu, Shiga 525-8577, Japan

• Okamoto Kanji

  Department of Micro System Technology, Ritsumeikan University, Kusatsu, Shiga 525-8577, Japan

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• Local Self-Heating of Pyrolyzed Polymer Microstructure for Further Carbonization at Higher Temperature on Silicon Chip

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