Study of Amorphous Carbon Nitride Films Aiming at White Light Emitting Devices
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概要
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The possibility for white light emitting devices using carbon nitride (CNx) thin films has been studied. Microwave electron cyclotron resonance (ECR)–plasma chemical vapor deposition (CVD) and RF-sputtering apparatuses have been used for the formation of CNx thin films. In both cases, CH4 was used as the source or sub-source of carbon in order to investigate the effect of hydrogenated carbon nitride for luminescence. The cathodoluminescence (CL) measurement of the film grown by ECR–plasma CVD method showed three peaks of red, green, and blue (R/G/B). The photoluminescence (PL) measurement of the film grown by RF-sputtering also showed the red peak, which could not be observed in the film without hydrogen. Together with the X-ray photoelectron spectroscopy (XPS) analysis data, we concluded that the red peak originates from the level relating to H atom and blue peak from C–N bonds.
- 2008-10-25
著者
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國次 真輔
岡山県工業技術センター
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KUNITSUGU Shinsuke
Industrial Technology Center of Okayama Prefecture
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國次 真輔
岡山県工業技術センター 研究開発部
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Itoh Kunio
Tsuyama National College Of Technology Department Of Electrical And Electronic Engineering
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Takarabe Kenichi
Okayama University Of Science
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Takarabe Kenichi
Okayama University of Science, 1-1 Ridai-cho, Okayama 700-0005, Japan
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Iwano Yuta
Tsuyama National College of Technology, 624-1 Numa, Tsuyama, Okayama 708-8509, Japan
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Kittaka Toshiaki
Okayama University of Science, 1-1 Ridai-cho, Okayama 700-0005, Japan
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Tabuchi Hidekazu
Okayama University of Science, 1-1 Ridai-cho, Okayama 700-0005, Japan
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Soukawa Masaya
Okayama University of Science, 1-1 Ridai-cho, Okayama 700-0005, Japan
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Kunitsugu Shinsuke
The Industrial Technology Center of Okayama Prefecture, Okayama 701-1296, Japan
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Kunitsugu Shinsuke
Industrial Technology Center of Okayama Prefecture, 5301 Haga, Okayama 701-1296, Japan
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Itoh Kunio
Tsuyama National College of Technology, 624-1 Numa, Tsuyama, Okayama 708-8509, Japan
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