X-ray Photoelectron Spectroscopic Study of Pulsed Laser Deposited V–W–Nd Mixed Oxide Films
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概要
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V–W–Nd mixed-oxide films were prepared by pulsed laser deposition (PLD) from targets sintered at different temperatures. An atomic force microscopy (AFM) image of the films fabricated from the target sintered at 923 K reveals that the average particle size is estimated to be approximately 86 nm and the rms surface roughness of the films is 8.2 nm. X-ray photoelectron spectroscopy (XPS) data indicates that the film fabricated from the targets sintered at a low temperature was composed of various mixed valences, and that the doping of tungsten hindered film crystallization, which urged the generation of a super oxide anion radical (O2-). Here, we discuss the detection method of O2- from the XPS analysis of the thin films.
- 2007-05-15
著者
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Kanno Yoshinori
Interdisciplinary Graduate School Of Medicine And Engineering University Of Yamanashi
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Venkatachalam Shanmugam
Interdisciplinary Graduate School of Medicine and Engineering, University of Yamanashi, 4-3-11 Takeda, Kofu 400-8511, Japan
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Iida Yusuke
Interdisciplinary Graduate School of Medicine and Engineering, University of Yamanashi, 4-3-11 Takeda, Kofu 400-8511, Japan
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Kaneko Yoshikazu
Interdisciplinary Graduate School of Medicine and Engineering, University of Yamanashi, 4-3-11 Takeda, Kofu 400-8511, Japan
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