Micropatterning of Indium Tin Oxide Thin Films by Selective Deposition and Improvement in Selectivity by Combination with Substrate Vibration

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概要

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• The micropatterning of indium tin oxide (ITO) thin films was achieved by selective deposition without etching. Self-assembled monolayers (SAMs) of 1H,1H,2H,2H-perfluorodecyltriethoxysilane [CF3(CF2)7CH2CH2Si(OC2H5)3; FAS] were patterned on glass substrates. The patterned SAMs on these surfaces defined the selective area in which the liquid-source misted chemical deposition (LSMCD) of the ITO thin films was performed. We clarified that the mist dropped in the area with FAS coverage moves to the area without FAS coverage. Furthermore, we successfully improved the selectivitiy of micropatterning by combination with substrate vibration. By this vibration technique, the amount of mist remaining in the area with FAS coverage drastically decreased. These results show that a selective deposition technique is promising for application to various kinds of device that need micropatterning.

• 2007-05-15

著者

• MITANI Tadaoki

  Japan Advanced Institute of Science and Technology

• Shimoda Tatsuya

  Japan Science and Technology Agency, ERATO, Shimoda Nano-Liquid Process Project, 2-5-3 Asahidai, Nomi, Ishikawa 923-1211, Japan

• Takakuwa Atsushi

  Advanced Device Research and Development Department, SEIKO EPSON Corporation, Fujimi, Nagano 399-0293, Japan

• Takakuwa Atsushi

  Advanced Materials Application and Development Department, SEIKO EPSON Corporation, 281 Fujimi, Fujimi-machi, Nagano 399-0293, Japan

• Mitani Tadaoki

  Japan Advanced Institute of Science and Technology, 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan

• Shimoda Tatsuya

  Japan Advanced Institute of Science and Technology, 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan

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