Effects of Copper Doping on Structure and Properties of TiN Films Prepared by Magnetron Sputtering Assisted by Low Energy Ion Flux Irradiation
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概要
- 論文の詳細を見る
Ti–Cu–N films containing approximately 0–10 at. % Cu were deposited on Si(100) substrates with high-density low-energy ion flux irradiation by inductively coupled plasma (ICP)-assisted magnetron sputtering. The effects of Cu doping on film microstructures, morphology and properties were investigated. The addition of a small amount of Cu markedly modified the preferred orientation and morphology, and significantly increased film hardness. A Ti–Cu–N film containing 2 at. % Cu has a maximum hardness of approximately 42 GPa. This film was characterized as having a nanocomposite structure, consisting of nanocolumns of TiN crystallites with very small Cu crystallites inside the column boundaries. The hardness increase was attributed to a nanocomposite effect.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2006-06-15
著者
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Li Zhuguo
School Of Materials Science And Engineering Shanghai Jiao Tong University
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Miyake Shoji
Liaison Center Kinki University
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Wu Yixiong
School Of Materials Science And Engineering Shanghai Jiao Tong University
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Wu Yixiong
School of Materials Science and Engineering, Shanghai Jiao Tong University, Shanghai 200030, P. R. China
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Miyake Shoji
Liaison Center, Kinki University, Osaka 577-8502, Japan
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Li Zhuguo
School of Materials Science and Engineering, Shanghai Jiao Tong University, Shanghai 200030, P. R. China
関連論文
- Effects of Copper Doping on Structure and Properties of TiN Films Prepared by Magnetron Sputtering Assisted by Low Energy Ion Flux Irradiation
- Effect of Low-Energy Ion Flux Irradiation on Synthesis of Superhard Nanocomposite Films
- Effects of Copper Doping on Structure and Properties of TiN Films Prepared by Magnetron Sputtering Assisted by Low Energy Ion Flux Irradiation
- Effect of Low-Energy Ion Flux Irradiation on Synthesis of Superhard Nanocomposite Films