Effective Surface Area of SnO2-Sputtered Films Evaluated by Measurement of Physical Adsorption Isotherms

概要

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The microstructure of SnO2 sputtered films was investigated by field emission electron microscopy (FE-SEM), and by the measurement of film density and physical adsorption isotherms. FE-SEM shows that the SnO2-sputtered films are composed of columnar grains with thicknesses of about 10–45 nm. The density of the film deposited at a high temperature of 573 K and a low pressure of 0.4 Pa was $6.38\times 10^{3}$ kg/m3. On the other hand, the density of the film deposited at room temperature and a high pressure of 12 Pa was $3.82\times 10^{3}$ kg/m3. This value is much lower than the bulk density $6.95\times 10^{3}$ kg/m3, indicating that the film is very porous. According to the results of the physical adsorption isotherms for Kr gas, the effective surface area of this porous film was 91.0 times larger than the apparent surface area, indicating that the columnar grains are mostly isolated by gaps. Furthermore, the density is discussed in relation to the total pore volume determined from pore size distributions.
Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
2006-12-15