Step-Coverage Simulation for Molybdenum Silicide Sputtering Film
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概要
- 論文の詳細を見る
Step-coverage calculation for molybdenum silicide films was carried out using a model constructed by modifying the string model often used for the calculation of aluminum film step coverage. In the model, the film composition around steps as well as the thickness can be calculated. It was concluded that the difference between the angular distribution of the Mo atom and that of the Si atom caused not only the nonuniformity of the film composition at flat surface but also the deviation of the film composition around steps from that at flat surface.
- 社団法人応用物理学会の論文
- 1993-12-01
著者
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Yamazaki Toshinari
Faculty Of Engineering Toyama University
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Kitahara A
Metropolitan Industrial Technol. Res. Inst. Setagaya Ward Tokyo Jpn
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IKEDA Nagayasu
Faculty of Engineering, Toyama University
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NAKASHIMA Yoshiro
Faculty of Engineering, Toyama University
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SUGIMOTO Keiro
Faculty of Education, Toyama University
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KITAHARA Akira
Faculty of Education, Toyama University
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Sugimoto Keiro
Faculty Of Education Toyama University
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Ikeda Nagayasu
Faculty Of Engineering Toyama University
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Nakashima Yoshiro
Faculty Of Engineering Toyama University
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