Composition Control of NiTi Shape Memory Alloy Films Formed by Sputter Deposition with a Composite Target
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2000-10-15
著者
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Yamazaki Toshinari
Faculty Of Engineering Toyama University
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Takeda Fumio
Toyama National College Of Technology
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NAKAJIMA Takayoshi
Toyama National College of Technology
関連論文
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- Dependence of Composition Distribution of NiTi Sputtered Films on Ar Gas Pressure : Surfaces, Interfaces, and Films
- Step Coverage of Molybdenum Silicide Sputtering Films Investigated by Monte Carlo Method
- Characteristics of Impurity-Doped GaSe Radiation Detectors
- High Velocity and High Coupling Surface Acoustic Waves Using ZnO Films on Ceramic Substrates with High Acoustic Velocity : SAW and Communication Devices
- High Rate Deposition of Thick Piezoelectric ZnO and AlN Films Using a New Magnetron Sputtering Technique : Communication Devices and Materials
- Preparation of Tungsten-Bronze Thin Films : Thin Films
- Composition Control of NiTi Shape Memory Alloy Films Formed by Sputter Deposition with a Composite Target
- Step-Coverage Simulation for Molybdenum Silicide Sputtering Film
- Effective Surface Area of SnO2-Sputtered Films Evaluated by Measurement of Physical Adsorption Isotherms