Improvement in Laser-Induced Damage Threshold of Antireflection Coatings for High-Power UV Lasers by Removing Subsurface of Large lenses
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概要
- 論文の詳細を見る
We improved the laser-induced damage threshold (LIDT) of antireflection coatings for a wavelength of 355 nm by removing the subsurface of the substrate with an ion beam etching system. The ion beam etching system is set up in a coating chamber to etch 1000 mm optics uniformly. The antireflection coating composed of MgF2, Al2O3 and SiO2 layers has an excellent LIDT of 9.2 J/cm2 which is the highest reported LIDT in the world (355 nm, 0.3 ns pulsed laser).
- 2004-09-15
著者
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Otani Minoru
Canon Inc. Optics R&d Center
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Ishikura Junri
Canon Inc. Optics R&d Center
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Fujimura Hidehiko
Canon Inc. Optics R&d Center
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Yoshida Kunio
Department Of Chemical Engineering University Of Tokyo
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Otani Minoru
Canon Inc., Optics R&D Center, 23-10, Kiyohara-Kogyodanchi, Utsunomiya, Tochigi 321-3231, Japan
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Fujimura Hidehiko
Canon Inc., Optics R&D Center, 23-10, Kiyohara-Kogyodanchi, Utsunomiya, Tochigi 321-3231, Japan
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