Pulsed-Laser Deposition of LiNbO3 in Low Gas Pressure Using Pure Ozone

概要

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Pulsed-laser deposition (PLD) growth of stoichiometric LiNbO3 has been investigated in detail in the low gas pressure region where the mean free path of ablated species is longer than the target-to-substrate distance. We have found that the reduction of gas pressure effectively suppresses Li deficiency, and therefore, is a promising way of overcoming the nonstoichiometory problem that has been inherent to the conventional PLD growth of LiNbO3. In such low-pressure growth, we have found that ozone atmosphere is more favorable than that of molecular oxygen, because the crystallographic quality and surface flatness is better in films grown with ozone than in those grown with molecular oxygen. These results open the way to nanoscale lattice engineering of Li-containing oxide materials.
Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
2004-08-15