Pulsed-Laser Deposition of LiNbO_3 in Low Gas Pressure Using Pure Ozone
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2004-08-15
著者
-
Tsukada Ichiro
Central Research Institute Of Electric Power Industry
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HIGUCHI Sadao
Central Research Institute of Electric Power Industry
関連論文
- Mobility analysis of FeTe thin films
- Pulsed-Laser Deposition of LiNbO_3 Thin Films at Low Oxidation Gas Pressure with Pure Ozone
- Pulsed-Laser Deposition of LiNbO_3 in Low Gas Pressure Using Pure Ozone
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- Epitaxial Growth of FeSe_Te_ Thin Films on CaF_2 Substrates with High Critical Current Density
- Mobility Analysis of FeTe Thin Films
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- Empirical Selection Rule of Substrate Materials for Iron Chalcogenide Superconducting Thin Films
- Substrate Dependence of Structural and Transport Properties in FeSe0.5Te0.5 Thin Films
- Effect of Vacuum Annealing on Superconductivity in Fe(Se,Te) Single Crystals
- Pulsed-Laser Deposition of LiNbO3 Thin Films at Low Oxidation Gas Pressure with Pure Ozone
- Pulsed-Laser Deposition of LiNbO3 in Low Gas Pressure Using Pure Ozone