Glass Transition Temperature Monitoring in Bilayer and Patterned Photoresist Films

概要

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Monitoring of glass transition temperature in complex lithographic structures using an interferometry based methodology, is demonstrated. The method is applied in the case of bilayer photoresist structures, where the $T_{\text{g}}^{\text{film}}$ values of both bottom and top polymeric layers are measured simultaneously. Furthermore, in the case of processed photoresist films the obtained signal provides the $T_{\text{g}}^{\text{film}}$ value of resist areas exposed at different doses, enabling in situ measurements for material and process optimization studies.
INSTITUTE OF PURE AND APPLIED PHYSICSの論文
2004-08-15