Glass Transition Temperature Monitoring in Bilayer and Patterned Photoresist Films

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概要

• 論文の詳細を見る
• 2004-08-15

著者

• Raptis Ioannis

  Institute Of Microelectronics Ncsr "demokritos

• NIAKOULA Dimitra

  Institute of Microelectronics, NCSR "DEMOKRITOS"

• GOUSTOURIDIS Dimitrios

  Institute of Microelectronics, NCSR "DEMOKRITOS"

• ARGITIS Panagiotis

  Institute of Microelectronics, NCSR "DEMOKRITOS"

関連論文

• Determination of Acid Diffusion Parameters and Proximity Effect Correction for Highly Dense 0.15 μm Features on SAL-601
• Glass Transition Temperature Monitoring in Bilayer and Patterned Photoresist Films
• Silylation and Dry Development of Chemically Amplified Resists SAL601, AZPN114, and Epoxidised Resist (EPR) for High Resolution Electron-Beam Lithography
• Resist Lithographic Performance Enhancement Based on Solvent Removal Measurements by Optical Interferometry : Semiconductors
• Glass Transition Temperature Monitoring in Bilayer and Patterned Photoresist Films

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