Advantage of Thin-Film Filter for Reliable Photoemission Spectroscopy Using High-Flux Discharging Lamp
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概要
- 論文の詳細を見る
An aluminum film with a thickness of 1500 Å has been used as a filter for the He I$\alpha$ resonance line (21.2182 eV) from a microwave-driven high-flux discharging lamp to reduce the degradation of sample surfaces during photoemission spectroscopy (PES) measurements. A marked increase in the lifetime of sample surfaces, which overcomes a ${\sim}90$% intensity reduction, has been observed. The thin-film filter, if combined with a high-flux discharging lamp, provides clean vacuum ultraviolet lights for reliable PES measurements with an ultrahigh resolution.
- INSTITUTE OF PURE AND APPLIED PHYSICSの論文
- 2004-06-15
著者
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TSUDA Shunsuke
Institute for Solid State Physics, University of Tokyo
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MOCHIKU Takashi
National Institute for Materials Science
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Kiss Takayuki
Institute For Solid State Physics University Of Tokyo
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Hirata Kazuto
National Institute For Material Science
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Yokoya Takayoshi
Institute For Solid State Physical University Of Tokyo
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Shin Shik
Institute For Solid State Physics (issp) University Of Tokyo
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Shin Shik
Institute for Solid State Physics, University of Tokyo, Kashiwa Chiba 277-8581, Japan
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Yokoya Takayoshi
Institute for Solid State Physics, University of Tokyo, Kashiwa Chiba 277-8581, Japan
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Tsuda Shunsuke
Institute for Solid State Physics, University of Tokyo, Kashiwa Chiba 277-8581, Japan
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Kiss Takayuki
Institute for Solid State Physics, University of Tokyo, Kashiwa Chiba 277-8581, Japan
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