Retention and Read Endurance Characteristics of a Ferroelectric Gate Field Effect Transistor Memory with an Intermediate Electrode
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概要
- 論文の詳細を見る
Fundamental characteristics such as retention and read endurance of a ferroelectric gate field effect transistor (F-FET) memory with an intermediate electrode were investigated and reported. It was verified that the retention time of the new F-FET was longer than 98 h. By taking into account the leakage currents of both the ferroelectric capacitor $C_{\text{f}}$ and the MOSFET used for data writing (W-FET), we found that, for positive reading voltage, the leakage currents of the ferroelectric capacitor and the W-FET are unfavorable for the $P_{\text{r}}{}^{+}$ state and the $P_{\text{r}}{}^{-}$ state, respectively, in terms of read endurance. The overall read endurance is determined by a competition between the leakage currents of the $C_{\text{f}}$ and the W-FET. The drain-connected configuration (DCC) was effective to minimize the unexpected influence of the leakage current of the W-FET.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2004-04-15
著者
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Horita Susumu
Japan Advanced Inst. Sci. And Technol. Ishikawa Jpn
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KHOA Tran
Japan Advanced Institute of Science and Technology
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Khoa Tran
Japan Advanced Institute of Science and Technology, 1-1 Asahidai, Tatsunokuchi, Ishikawa 923-1292, Japan
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