Electron Optics Properties of Electron Beam Stepper
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概要
- 論文の詳細を見る
Electron projection lithography (EPL) is one of the most reliable lithography tools for 65 nm node generation and below. An electron optics (EO) subsystem, which has been developed in collaboration with IBM, and Nikon's original stage/body are integrated into an electron beam (EB) stepper. The latest EO properties of the EB stepper are discussed. Experimentally, the curvilinear variable axis lens (CVAL) adjustment is established. Therefore, good resolution (better than 80 nm) and low nonlinear distortion (approximately 10 nm) is obtained at the maximum (2.5 mm) deflected sub-field on the test stand. After docking with body and stages, good resolution (better than 90 nm) is achieved for the on-axis beam.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2003-06-15
著者
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Shimizu Sumito
2nd Development Department Ic Equipment Division Nikon Corporation
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YAMADA Atsushi
2nd Development Department, IC Equipment Division, Nikon Corporation
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OKAMOTO Kazuya
2nd Development Department, IC Equipment Division, Nikon Corporation
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UMEMOTO Takaaki
2nd Development Department, IC Equipment Division, Nikon Corporation
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KOJIMA Shinichi
2nd Development Department, IC Equipment Division, Nikon Corporation
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FUJIWARA Tomoharu
2nd Development Department, IC Equipment Division, Nikon Corporation
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Ikeda Junji
2nd Development Department Ic Equipment Division Nikon Corporation
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Takahashi Shin-ichi
2nd Development Department Ic Equipment Division Nikon Corporation
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Hamashima Muneki
2nd Development Department Ic Equipment Division Nikon Corporation
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Yahiro Takehisa
2nd Development Department Ic Equipment Division Nikon Corporation
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Shimizu Hiroyasu
2nd Designing Department Ic & Lcd Equipment Division Ohi Plant Nikon Corporation
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Yahiro Takehisa
2nd Development Department, IC Equipment Division, Nikon Corporation; 201-9 Miizugahara, Kumagaya, Saitama 360-8559, Japan
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Kojima Shinichi
2nd Development Department, IC Equipment Division, Nikon Corporation; 201-9 Miizugahara, Kumagaya, Saitama 360-8559, Japan
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Umemoto Takaaki
2nd Development Department, IC Equipment Division, Nikon Corporation; 201-9 Miizugahara, Kumagaya, Saitama 360-8559, Japan
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Ikeda Junji
2nd Development Department, IC Equipment Division, Nikon Corporation; 201-9 Miizugahara, Kumagaya, Saitama 360-8559, Japan
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Takahashi Shin-ichi
2nd Development Department, IC Equipment Division, Nikon Corporation; 201-9 Miizugahara, Kumagaya, Saitama 360-8559, Japan
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Hamashima Muneki
2nd Development Department, IC Equipment Division, Nikon Corporation; 201-9 Miizugahara, Kumagaya, Saitama 360-8559, Japan
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Fujiwara Tomoharu
2nd Development Department, IC Equipment Division, Nikon Corporation; 201-9 Miizugahara, Kumagaya, Saitama 360-8559, Japan
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Shimizu Sumito
2nd Development Department, IC Equipment Division, Nikon Corporation; 201-9 Miizugahara, Kumagaya, Saitama 360-8559, Japan
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