Electron Optics Properties of Electron Beam Stepper
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2003-06-30
著者
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Shimizu Sumito
2nd Development Department Ic Equipment Division Nikon Corporation
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YAMADA Atsushi
2nd Development Department, IC Equipment Division, Nikon Corporation
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OKAMOTO Kazuya
2nd Development Department, IC Equipment Division, Nikon Corporation
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UMEMOTO Takaaki
2nd Development Department, IC Equipment Division, Nikon Corporation
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SHIMIZU Hiroyasu
2nd Development Department, IC Equipment Division, Nikon Corporation
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TAKAHASHI Shin-ichi
2nd Development Department, IC Equipment Division, Nikon Corporation
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IKEDA Junji
2nd Development Department, IC Equipment Division, Nikon Corporation
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KOJIMA Shinichi
2nd Development Department, IC Equipment Division, Nikon Corporation
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YAHIRO Takehisa
2nd Development Department, IC Equipment Division, Nikon Corporation
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FUJIWARA Tomoharu
2nd Development Department, IC Equipment Division, Nikon Corporation
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HAMASHIMA Muneki
2nd Development Department, IC Equipment Division, Nikon Corporation
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Hamashima Muneki
2nd Development Department Ic Equipment Division Nikon Corporation
関連論文
- Electron Optics Properties of Electron Beam Stepper
- Symmetric Magnetic Doublet Optics with Dynamically Compensated Field Aberration for Reducing Image Projection System
- Optimization of Object-Image Distance for Aberration and Space-Charge Effect in Symmetric Magnetic Doublet with Dynamically Compensated Field Aberrations
- Secondary Electron Detection Efficiency for Magnetic Lenses with a Retarding Electrostatic Field
- Electron Optics Properties of Electron Beam Stepper