High-Emittance and Low-Brightness Electron Gun for Reducing-Image Projection System: Computer Simulation

スポンサーリンク

概要

• 論文の詳細を見る

• The required electron gun characteristics for a reducing-image projection system so that the emittance is much larger than 187 µ m· mrad and the brightness is variable around 7.3×104 A/cm2 sr are estimated. For an electron gun with flat cathode, Wehnelt, control-anode and anode electrodes, an emittance of more than 1000 µ m· mrad is obtained by optimization of the cathode to control anode distance, the control-anode radius and the Wehnelt electrode shape. The brightness is variable from 3.9×104 to 9×104 A/cm2 sr by control of the control-anode voltage. The optimum control-anode radius increases and the brightness tends to decrease with increasing cathode to control-anode distance. The angle between the beam edge and Wehnelt electrode is optimum at about 62°, which is smaller than the well-known 67.5° in a Pierce-type electron gun.

• INSTITUTE OF PURE AND APPLIED PHYSICSの論文
• 1997-04-15

著者

• Shimizu Hiroyasu

  1st Designing Department Ic & Lcd Equipment Division Ohi Plant Nikon Corporation

• Nakasuji Mamoru

  1st Designing Department Ic & Lcd Equipment Division Ohi Plant Nikon Corporation

• Nakasuji Mamoru

  1st Designing Department, IC & LCD Equipment Division, Ohi Plant, Nikon Corporation,

関連論文

• High-Emittance and Low-Brightness Electron Gun for Reducing-Image Projection System: Computer Simulation
• Hollow Beam Electron Gun for Electron Beam Reducing Image Projection System : Computer Simulation
• High Efficiency Secondary Electron Detection for the Electron-Beam-Reducing Projection Lithography System
• Secondary Electron Detection for Multiple-Channel Scanning Electron Microscope : Computer Simulation
• High-Emittance and Low-Brightness Electron Gun for Reducing-Image Projection System: Computer Simulation

スポンサーリンク