High Efficiency Secondary Electron Detection for the Electron-Beam-Reducing Projection Lithography System

概要

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The secondary electron (SE) trajectories are calculated for two cases, in which the axial magnetic field from the projection lens at the target is zero and not zero. In the former case, SEs are easily detected by the SE detector, which is placed distant from the optical axis. For the latter case, it is difficult to detect SEs. The reasons are clear because, for the former case, the magnetic flux never crosses the target plane, and for the latter case, most of the magnetic flux crosses the target plane, and SEs with relatively small initial SE energy (E_i) tend to travel along the magnetic flux. When an axially symmetric electrostatic field whose potential at the optical axis is 0.35 V, for the maximum E_i of 30 eV and the emission angle of 30°, and for the E_i of 3 eV and the maximum emission angle of 89°, all the SEs are detected by the SE detector.
社団法人応用物理学会の論文
1999-12-15