Surface Treatment Effect of (NH4)2Sx on $ p$-type GaAs Field Emitter Arrays
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概要
- 論文の詳細を見る
Uniform GaAs field emitter arrays (FEAs) with sharp tips for a field emission electron source were obtained by wet chemical etching method. The surface of the GaAs tips were passivated by sulfur atoms by dipping it into (NH4)2Sx combined with subsequent ultra high vacuum (UHV) annealing and was characterized by X-ray photoelectron spectroscopy (XPS). Using the GaAs FEAs with sulfur passivation, emission current with a saturation characteristic was obtained.
- 2007-08-25
著者
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SHIMOMURA Masaru
Graduate School of Agriculture, Kinki University
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Han Gui
Graduate School of Electronic Science and Techonology, Shizuoka University
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Mimura Hidenori
Graduate School Electronic Science And Technology
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Liu Xin
Research Institute of Electronics, Shizuoka University, 3-5-1 Johoku, Hamamatsu 432-8011, Japan
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Shimomura Masaru
Graduate School of Electronic Science and Technology, Shizuoka University, 3-5-1 Johoku, Hamamatsu 432-8011, Japan
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Takigawa Yoshihito
Research Institute of Electronics, Shizuoka University, 3-5-1 Johoku, Hamamatsu 432-8011, Japan
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Neo Yoichiro
Graduate School of Electronic Science and Technology, Shizuoka University, 3-5-1 Johoku, Hamamatsu 432-8011, Japan
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Han Gui
Graduate School of Electronic Science and Technology, Shizuoka University, 3-5-1 Johoku, Hamamatsu 432-8011, Japan
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Mimura Hidenori
Graduate School of Electronic Science and Technology, Shizuoka University, 3-5-1 Johoku, Hamamatsu 432-8011, Japan
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