Effects of Ar/N2 Flow Ratio on Sputtered-AlN Film and Its Application to Low-Voltage Organic Thin-Film Transistors
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概要
- 論文の詳細を見る
In this work, we applied a low-temperature (150 °C) alumina nitride (AlN) film as the gate dielectric in organic thin-film transistors (OTFTs). It was found that the Poole–Frenkel-type leakage can be suppressed by increasing the nitrogen gas ratio in the deposition process. The thin and low-leakage AlN dielectric was characterized and then utilized in pentacene-based OTFTs. The proposed AlN dielectric greatly lowers the OTFT operating voltage (${<}5$ V). A low threshold voltage ($-1.5$ V), a low subthreshold swing (104 mV/decade), and a high on/off current ratio (${>}10^{5}$) were also obtained for the AlN-OTFTs.
- INSTITUTE OF PURE AND APPLIED PHYSICSの論文
- 2006-10-25
著者
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Liu Pu-kuan
Department Of Photonics And Institute Of Electro-optical Engineering And Display Institute National
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Ku Kuo-hsin
Department Of Materials Science And Engineering National Tsing Hua University
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Chen Chien-hsun
Department Of Civil Engineering Clemson University
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Yen Kuo-Hsi
Department of Photonics and Institute of Electro-Optical Engineering and Department of Photonics and Display Institute, National Chiao Tung University, Hsinchu, Taiwan 300, Republic of China
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Hwang Jennchang
Department of Material Science and Engineering, National Tsing Hua University, Hsinchu 300, Taiwan
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Zan Hsiao-Wen
Department of Photonics & Institute of Electro-Optical Engineering, National Chiao Tung University, Hsinchu 300, Taiwan, R.O.C.
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Liu Pu-Kuan
Department of Photonics and Institute of Electro-Optical Engineering and Display Institute, National Chiao Tung University, HsinChu 300, Taiwan
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Zan Hsiao-Wen
Department of Photonics and Institute of Electro-Optical Engineering and Display Institute, National Chiao Tung University, HsinChu 300, Taiwan
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Ku Kuo-Hsin
Department of Materials Science and Engineering, National Tsing Hua University, HsinChu 300, Taiwan
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Chen Chien-Hsun
Department of Materials Science and Engineering, National Tsing Hua University, HsinChu 300, Taiwan
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